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Titel:
Electron energy-loss spectroscopy of boron-doped layers in amorphous thin film silicon solar cells
 
Auteur(s):
Duchamp, M.; Boothroyd, C.B.; Moreno, M.S.; Aken, B.B. van; Soppe, W.J.; Dunin-Borkowski, R.E.
 
Gepubliceerd door: Publicatie datum:
ECN Zonne-energie 7-3-2013
 
ECN publicatienummer: Publicatie type:
ECN-W--13-005 Artikel wetenschap tijdschrift
 
Aantal pagina's:
9  

Gepubliceerd in: Journal of Applied Physics (American Institute of Physics), , 2013, Vol.113, p.093513-.

Samenvatting:
Electron energy-loss spectroscopy (EELS) is used to study p-doped layers in n-i-p amorphous thin film Si solar cells grown on steel foil substrates. For a solar cell in which an intrinsic amorphous hydrogenated Si (a-Si-H) layer is sandwiched between 10-nm-thick n-doped and p-doped a-Si:H layers, we assess whether core-loss EELS can be used to quantify the B concentration. We compare the shape of the measured B K edge with real space ab initio multiple scattering calculations and show that it is possible to separate the weak B K edge peak from the much stronger Si L edge fine structure by using log-normal fitting functions. The measured B concentration is compared with values obtained from secondary ion mass spectrometry, as well as with EELS results obtained from test samples that contain 200-nm-thick a-Si:H layers co-doped with B and C. We also assess whether changes in volume plasmon energy can be related to the B concentration and/or to the density of the material and whether variations of the volume plasmon line-width can be correlated with differences in the scattering of valence electrons in differently doped a-Si:H layers.

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