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Carbon footprint of PECVD chamber cleaning
Schottler, M.; Wild - Scholten, M.J. de
Gepubliceerd door: Publicatie datum:
ECN Zonne-energie 28-11-2008
ECN publicatienummer: Publicatie type:
ECN-W--08-063 Artikel wetenschap tijdschrift
Aantal pagina's:

Gepubliceerd in: Photovoltaics International (PV-Tech), , 2008, Vol.2, p.64-69.

The use of perfluorinated gases such as NF3, CF4 or SF6 for PECVD (plasma enhanced chemical vapor deposition) chamber cleaning has a much higher impact on global warming than does the use of onsite-generated F2. This holds true even when supposing that in the future much more effort is paid for the correct abatement and a leak-free supply and take-back chain. This paper will discuss the steps available to the PV industry for control and reduction of carbon emissions in the chamber cleaning process.

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